SUBSTRATE TREATING BATH OF SEMICONDUCTOR MANUFACTURING APPARATUS,申请号KR20040080519-传众专利搜索

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发明名称	SUBSTRATE TREATING BATH OF SEMICONDUCTOR MANUFACTURING APPARATUS
摘要
申请公布号	KR20060031469(A)	申请公布日期	2006.04.12
申请号	KR20040080519	申请日期	2004.10.08
申请人	SEMES CO., LTD.	发明人	KO, SANG JIN;JIN, DONG GYU
分类号	H01L21/3063;H01L21/304	主分类号	H01L21/3063
代理机构		代理人
主权项
地址

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