PHOTORESIST AND ORGANIC ANTI-REFLECTIVE POLYMER WHICH CAN BE USED IN THE 248nm KrF MICRO PATTERN-FORMING PROCESS AND PHOTIRESIST AND ANTI-REFLECTIVE COMPOSITION COMPRISING THEREOF,申请号KR20030094721-传众专利搜索

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发明名称	PHOTORESIST AND ORGANIC ANTI-REFLECTIVE POLYMER WHICH CAN BE USED IN THE 248nm KrF MICRO PATTERN-FORMING PROCESS AND PHOTIRESIST AND ANTI-REFLECTIVE COMPOSITION COMPRISING THEREOF
摘要
申请公布号	KR100570210(B1)	申请公布日期	2006.04.12
申请号	KR20030094721	申请日期	2003.12.22
申请人		发明人
分类号	G03F7/039	主分类号	G03F7/039
代理机构		代理人
主权项
地址

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