Method for depositing RuO2 comprising ECR plasma pretreatment on the surface of TiN surface,申请号KR20040017569-传众专利搜索

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发明名称	Method for depositing RuO2 comprising ECR plasma pretreatment on the surface of TiN surface
摘要
申请公布号	KR100570320(B1)	申请公布日期	2006.04.12
申请号	KR20040017569	申请日期	2004.03.16
申请人		发明人
分类号	H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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