| 发明名称 |
Integrated circuit with reverse engineering protection |
| 摘要 |
<p>Technique and structures for camouflaging an integrated circuit structure. The integrated circuit structure is formed by a plurality of layers of material having controlled outlines and controlled thicknesses. A layer of dielectric material of a controlled thickness is disposed among said plurality of layers to thereby render the integrated circuit structure intentionally inoperable.</p> |
| 申请公布号 |
GB2405531(B) |
申请公布日期 |
2006.04.12 |
| 申请号 |
GB20040027115 |
申请日期 |
2003.05.06 |
| 申请人 |
HRL LABORATORIES LLC;RAYTHEON COMPANY |
发明人 |
LAP-WAI CHOW;WILLIAM M CLARK JR;JAMES P BAUKUS |
| 分类号 |
H01L21/331;H01L27/02;H01L21/822;H01L21/8238;H01L21/8247;H01L23/58;H01L27/04;H01L27/092;H01L27/115;H01L29/732;H01L29/78;H01L29/788;H01L29/792 |
主分类号 |
H01L21/331 |
| 代理机构 |
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代理人 |
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