发明名称 |
Electron beam lithography method |
摘要 |
An electron beam lithography method for performing lithography of elements included in a pattern by scanning a disk having resist coated thereon, placed on a rotating stage which is movable in a radial direction of the disk, with an electron beam while rotating the rotating stage. The electron beam has a beam diameter smaller than a minimum width of an element shape. The electron beam is reciprocally oscillated in a circumferential direction X approximately orthogonal to a radial direction Y of the disk and deflected in the radial direction Y, thereby filling in the element shape. Lithography of the elements is sequentially performed by rotating the disk unidirectionally, and thus a desired micropattern is drawn in the entire region of the disk. A lithographic length L of the element in the circumferential direction X may be defined by amplitude of the reciprocal oscillation of the electron beam.
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申请公布号 |
US7026098(B2) |
申请公布日期 |
2006.04.11 |
申请号 |
US20030700626 |
申请日期 |
2003.11.05 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KOMATSU KAZUNORI;USA TOSHIHIRO |
分类号 |
G03C5/00;H01J37/20;G03F7/20;G11B5/596;G11B5/82;G11B5/84;G11B5/86;G11B7/26;G11B7/28;H01J37/147;H01J37/305;H01J37/317 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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