Substituted oxime derivatives and the use thereof as latent acids

摘要

New oxime sulfonate compounds of the formula (I) and (II), wherein R₁ is C₁-C₁₂alkyl, C₁C₄haloalkyl, hydrogon, OR₉, NR₁₀R₁₁, SR₁₂ or is phenyl which is unsubstituted or substituted by OH, C₁-C₁₈alkyl, halogen and/or C₁-C₁₂alkoxy; R₂, R₃, R₄ and R₅ are for example hydrogen or C₁-C₁₂alkyl; R₆ is for example is C₁-C₁₈alkylsulfonyl, phenyl-C₁-C₃alkylsulfonyl or phenylsulfonyl; R'₆ is for example phenylenedisulfonyl or diphenylenedisulfonyl; R₇, R₈ and R₉ for example are hydrogen or C₁-C₆alkyl; R₁₀ and R₁₁, are for example hydrogen or C₁-C₁₈alkyl; R₁₂ is for example hydrogen, phenyl or C₁-C₁₈alkyl; A is S, O, NR₁₃, or a group of formula A1, A2 or A3, R₂₁ and R22 independently of one other have one of the meanings given for R₇; R₂₃, R₂₄, R₂₅ and R₂₆ independently of one another are for example hydrogen, C₁-C₄alkyl, halogen or phenyl; Z is CR₂₂ or N; and Z₁ is CR₂₂ or N; and Z₁ is CR₂₂ or N; and Z₁ is CH₂, S, O or NR₁₃ are particularly suitable as photo-latent acids in resist applications.