| 摘要 |
A photoresist composition comprising a resin having structural units represented by the following formulae (I), <CHEM> wherein R<1>, R<2>, R<3>, R<11>, R<12>, R<13>, R<21>, R<22> and R<23> each independently represents hydrogen or an alkyl; one of R<14>, R<15> and R<16> represents an aliphatic hydrocarbon residue and the rest each independently represents hydrogen or an aliphatic hydrocarbon residue, or two or three of R<14>, R<15> and R<16> form a hydrocarbon ring; and R represents a group cleavable by an action of an acid; and the photoresist composition affords excellent resolution, excellent profile and wide focus margin even on a substrate provided with an organic anti-reflective film. |
