Fabrication methods of a semiconductor device having multi-gate patterns,申请号KR20040063629-传众专利搜索

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发明名称	Fabrication methods of a semiconductor device having multi-gate patterns
摘要
申请公布号	KR100568540(B1)	申请公布日期	2006.04.07
申请号	KR20040063629	申请日期	2004.08.12
申请人		发明人
分类号	H01L21/336	主分类号	H01L21/336
代理机构		代理人
主权项
地址

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