VERTICAL DIFFUSION FURNACE FOR MANUFACTURING A SEMICONDUCTOR ELEMENT,申请号KR20000002362-传众专利搜索

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发明名称	VERTICAL DIFFUSION FURNACE FOR MANUFACTURING A SEMICONDUCTOR ELEMENT
摘要
申请公布号	KR100568536(B1)	申请公布日期	2006.04.07
申请号	KR20000002362	申请日期	2000.01.19
申请人		发明人
分类号	G06F5/00;H01L21/22	主分类号	G06F5/00
代理机构		代理人
主权项
地址

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