| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.
|
| 申请公布号 |
US2006072088(A1) |
申请公布日期 |
2006.04.06 |
| 申请号 |
US20040957751 |
申请日期 |
2004.10.05 |
| 申请人 |
ASML HOLDING N.V. |
发明人 |
LIPSON MATTHEW;DIERICHS MARCEL MATHIJS T.M.;DONDERS SJOERD NICOLAAS L.;MULKENS JOHANNES CATHARINUS H.;STREEFKERK BOB;WILKLOW RONALD;DE JONGE ROEL |
| 分类号 |
G03B27/42 |
主分类号 |
G03B27/42 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
