| 摘要 |
<P>PROBLEM TO BE SOLVED: To draw a fine pattern on a drawing object with an electron beam with high precision. <P>SOLUTION: AN electron beam drawing device X1 is equipped with an electron gun 12, a means of generating an electron beam pulse Bp to an original plate D by pulsating the electron beam B emitted by the electron gun 12, a means of controlling the duty ratio of the electronic beam pulse Bp, and a means of switching the state of whether the electron beam pulse is generated by the pulsating means. The pulsating means has a diaphragm plate 15 with an opening part 15a and deflectors 14A and 14B capable of respectively producing stopping electric fields deflecting the electron beam B so that the electron beam B does not pass through the opening part 15a; and the deflector 14A changes from a 1st state wherein the stopping electric field is generated to a 2nd state where it is not generated at fixed intervals and the deflector 14B changes from the 1st stage to the 2nd state at the same intervals with the deflector 14A in different timing. Further, the duty control means varies the difference in timing between state changes of the deflectors 14A and 14B. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
