| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reflection type mask blank capable of enhancing the thermal stability of reflectivity. <P>SOLUTION: The reflective mask blank has a board, a multilayered reflection film 2 which is formed on the board for reflecting exposing light, and an absorber film which is formed on the multilayered reflection film 2 for absorbing the exposing light. The multilayered reflection film 2 is composed of a material in which a silicon layer 7 and a molybdenum layer 6 are alternately laminated, and an anti-diffusion layer 8 composed of molybdenum and carbon, for example, an anti-diffusion layer composed of molybdenum carbide, dimolybdenum carbide or nitride thereof, is formed between the silicon layer 7 and the molybdenum layer 6. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
