发明名称 TRANSFER FILM SUBSTRATE FOR SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE USING IT
摘要 PROBLEM TO BE SOLVED: To provide a transfer film substrate for a semiconductor device which makes easy transfer of a wiring conductor formed on a transfer film to a sealing resin. SOLUTION: In the transfer film substrate 1 for the semiconductor device in which the wiring conductor 5 is formed on the transfer film 2, the wiring conductor 5 is formed by press punching a conductive metal tape 5t, and the wiring conductor 5 is temporarily press bonded on the transfer film 2. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006093577(A) 申请公布日期 2006.04.06
申请号 JP20040279646 申请日期 2004.09.27
申请人 HITACHI CABLE LTD;ONDA MAMORU 发明人 CHINDA SATOSHI;ONDA MAMORU
分类号 H01L23/12 主分类号 H01L23/12
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