发明名称 |
TRANSFER FILM SUBSTRATE FOR SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE USING IT |
摘要 |
PROBLEM TO BE SOLVED: To provide a transfer film substrate for a semiconductor device which makes easy transfer of a wiring conductor formed on a transfer film to a sealing resin. SOLUTION: In the transfer film substrate 1 for the semiconductor device in which the wiring conductor 5 is formed on the transfer film 2, the wiring conductor 5 is formed by press punching a conductive metal tape 5t, and the wiring conductor 5 is temporarily press bonded on the transfer film 2. COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006093577(A) |
申请公布日期 |
2006.04.06 |
申请号 |
JP20040279646 |
申请日期 |
2004.09.27 |
申请人 |
HITACHI CABLE LTD;ONDA MAMORU |
发明人 |
CHINDA SATOSHI;ONDA MAMORU |
分类号 |
H01L23/12 |
主分类号 |
H01L23/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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