发明名称 |
Mirror holding mechanism in exposure apparatus, and device manufacturing method |
摘要 |
Disclosed is a mirror holding system by which aberration resulting from deformation or positional deviation of an optical member, causing degradation of imaging performance, can be reduced whereby a desired optical performance is assured. Also disclosed is an exposure apparatus and a device manufacturing method based on such mirror holding system. The holding system includes a supporting member for supporting the optical element at a plurality of supports which are movable along an approximately radial direction about a predetermined point.
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申请公布号 |
US2006072219(A1) |
申请公布日期 |
2006.04.06 |
申请号 |
US20050282620 |
申请日期 |
2005.11.21 |
申请人 |
KINO YOSHIKI;MIWA YOSHINORI;HONDA MASANORI |
发明人 |
KINO YOSHIKI;MIWA YOSHINORI;HONDA MASANORI |
分类号 |
G02B7/00;G02B7/02;G02B7/182;G02B7/198;G03F7/20;H01L21/027 |
主分类号 |
G02B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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