发明名称 |
System and method for phase shift assignment |
摘要 |
A semiconductor design is provided having at least one feature at one of a line end and a line junction, and phase regions. At least one cut line is added to at least one of such features at line ends and such features at line junctions. Phases are assigned to the phase regions. The manufacturing of a photomask with the assigned phase regions is directed.
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申请公布号 |
US2006075376(A1) |
申请公布日期 |
2006.04.06 |
申请号 |
US20040942689 |
申请日期 |
2004.09.15 |
申请人 |
CHARTERED SEMICONDUCTOR MANUFACTURING, LTD. |
发明人 |
TAN SIA KIM;LIN QUNYING;HSIA LIANG-CHOO |
分类号 |
G03F1/00;G06F17/50 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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