| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology which can realize a fine processing in the order shorter than a visible light wave length at a low cost. <P>SOLUTION: The fine structure manufacturing method includes a photosensitive film forming process which forms a photosensitive film on the upper side of the to-be-processed object (100), an exposing process which generates interference light by crossing two laser beams (B1, B2) of a wave length shorter than a visible light wave length and exposes the photosensitive film by irradiating the interference light, a development process which develops the exposed photosensitive film to produce the shape according to the pattern of the interference light, and an etching process which etches the to-be-processed object with the developed photosensitive film as an etching mask. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
