| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent a mask from being shifted even when a speed of a substrate released from the mask after exposure by increasing a mask holding force, thereby increasing a throughput. <P>SOLUTION: A transparent glass plate 40 is fixedly located within a vacuum suction frame 26 for vacuum sucking a mask M, and air between the glass plate 40 and the mask M is vacuum sucked, so that the mask M is vacuum sucked by the frame 26 and the glass plate 40. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
