LITHOGRAPHY APPARATUS, GAS SUPPLY SYSTEM, METHOD FOR PURGING, AND DEVICE-MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY

摘要

PROBLEM TO BE SOLVED: To provide an improved lithographic apparatus capable of effectively cleaning an optical element.

SOLUTION: The lithography apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device.The patterning device imparts the beam of radiation with a pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam to a target portion of the substrate, and a gas supply system for supplying purge gases containing oxygen to a plurality of spaces in the apparatus. The gas supply system is arranged so that the purge gas supplied to each of the plurality of spaces is a premixed purge gas mixture composed by a gas supply system for each of the plurality of spaces on the basis of a predetermined relation that relates the desired amount of oxygen in the premixed purge gas mixture to the each space to which the premixed purge gas mixture is supplied.

COPYRIGHT: (C)2006,JPO&NCIPI