| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus, in which the movement of an object-replacing robot is not limited by the energizing cable of a detection device. <P>SOLUTION: The lithographic apparatus comprises an illumination system which conditions a radiation beam, a support structure which supports a patterning device for patterning the cross section of the radiation beam, a substrate table which holds a substrate, a projection system which projects the patterned beam onto a target portion of the substrate, and a robot which replaces a replaceable object. The robot includes a base part and a movable part; and movable part is movably connected to the base part and includes an object handler for handling the exchangeable object. The lithography apparatus, further includes an object detector which detects the exchangeable object in the object handler, the object detector includes a transmitter which transmits signals and a receiver which receives signals, and the transmitter and the receiver are arranged separated from the movable part of the robot. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
