| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To form a fine pattern under the same exposure conditions without depending upon the shape or closeness of the pattern. <P>SOLUTION: When mask data of a photomask which is provided, on a main surface of a transmissive substrate having translucency for exposure light, with a mask pattern having a semi-light-shielding portion and a phase shifter and a translucent portion where the mask pattern is not formed are generated, a shape of the mask pattern is determined and transmissivity of the semi-light-shielding portion is set first based upon the pattern to be formed by using the photomask. After an area whose width in the mask pattern is smaller than designated is extracted, the phase shifter is inserted into the extracted area and a peripheral edge part of an area whose width in the mask pattern exceeds the designated size. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
