| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask inspecting apparatus and method for electron-beam exposure and an electron-beam exposure system which performs an exposure-mask-pattern inspection highly accurately by using the electron-beam exposure system used practically. <P>SOLUTION: The mask inspecting apparatus has an electron-beam gun for generating an electron beam, an exposure mask for reshaping the electron beam into a predetermined sectional shape, a scanning means for performing a scan by using the electron beam reshaped by the exposure mask, a thin film having a transmission micro-hole for transmitting therethrough the electron beam used by the scanning means, a selecting means having its opening larger than the transmission micro-hole and for transmitting selectively a portion of the reshaped electron beam which is so constituted as to include a substrate having a thickness larger than the one of the thin film, and a sensing means for so sensing the electron beam transmitted through the selecting means as to output a current signal. The exposure-mask-pattern inspection is performed by this mask inspecting apparatus. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
