| 摘要 |
The present invention provides a system ( 100 ) for aligning a dispensing apparatus ( 110 ) utilized within a semiconductor deposition chamber ( 102 ). A stationary reference apparatus ( 106 ) is disposed along the bottom of the deposition chamber. A self-alignment support system ( 122 ), comprising one or more support components ( 124 ), is intercoupled between the dispensing apparatus and a deposition system exterior component ( 112 ). The self-alignment support system is adapted to facilitate and secure repositioning of the dispensing apparatus responsive to pressure applied to the dispensing surface ( 114 ) thereof. A non-yielding offset component ( 126 ) is placed upon a first surface ( 108 ) of the stationary reference apparatus. The dispensing surface of the dispensing apparatus is engaged with the offset component, and pressure is applied to the dispensing apparatus via the offset component until a desired alignment is achieved.
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