| 发明名称 |
PRECURSOR FOR FILM FORMATION AND METHOD FOR FORMING RUTHENIUM-CONTAINING FILM |
| 摘要 |
Precursor for ruthenium film deposition, comprising ruthenium tetroxide dissolved in at least one non-flammable solvent, preferably a fluorinated solvent having the general formula CxHyFzOtNu wherein:<I/>2x+2<=y+z and 2<=x<=15 and z>y and t+u>=1 (t+u preferably equal to 1) x, y, z, t and u being positive integers. |
| 申请公布号 |
WO2006035281(A1) |
申请公布日期 |
2006.04.06 |
| 申请号 |
WO2005IB02833 |
申请日期 |
2005.09.26 |
| 申请人 |
L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE;DUSSARRAT, CHRISTIAN;YANAGITA, KAZUTAKA;GATINEAU, JULIEN |
发明人 |
DUSSARRAT, CHRISTIAN;YANAGITA, KAZUTAKA;GATINEAU, JULIEN |
| 分类号 |
H01L21/02;C01G55/00;C23C16/06;C23C16/40;H01L21/285 |
主分类号 |
H01L21/02 |
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