发明名称 BRUSH POLISHING METHOD FOR INNER PERIPHERAL END FACE OF SUBSTRATE FOR RECORDING MEDIUM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a polishing method for inner peripheral end faces of substrates for a plurality of recording mediums without variation in polishing degree. <P>SOLUTION: The brush polishing method is used for polishing the inner peripheral end faces of the substrates 8 for the disk-type recording mediums, and comprised of the following steps. In the first step, the plurality of substrates 8 for the disk-type recording mediums each having a circular hole exhibiting the inner peripheral end face at the center are superposed on each other to form a polishing object having a cylindrical hole at the center. In the second step, the polishing object is brought into contact with abrasive slurry 7 containing abrasive. In the following step, while the slurry 7 makes contact with the polishing object, a polishing brush 4 obtained by arranging brushing bristles on a peripheral surface of a rod shaft is inserted into the cylindrical hole formed in the polishing object from a first side of the polishing object, and the polishing brush 4 is rotated about the shaft, to thereby polish the inner peripheral end faces of the respective substrates 8. In the further following step, while the slurry 7 makes contact with the polishing object, the polishing brush 4 is inserted into the cylindrical hole of the polishing object from a second side opposite to the first side, and the polishing brush 4 is rotated about the shaft, to thereby polish the inner peripheral end faces of the respective substrates 8. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006088322(A) 申请公布日期 2006.04.06
申请号 JP20050242585 申请日期 2005.08.24
申请人 SHOWA DENKO KK 发明人 AIDA KATSUAKI;MACHIDA HIROYUKI
分类号 B24B29/00;B24B29/04;B24B37/00 主分类号 B24B29/00
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