发明名称 RADIATION CURABLE COMPOSITION, ITS STORING METHOD, CURED FILM FORMING METHOD, PATTERN FORMING METHOD, PATTERN USAGE, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation curable composition for obtaining a hardener superior in pattern precision even when an exposure amount is comparatively small, and to provide its storing method, a cured film forming method, and a pattern forming method. <P>SOLUTION: The radiation curable composition contains (a) a component: a siloxane resin, (b) a component: a photo-acid generating agent or an optical base generating agent, and (c) a component: a solvent capable of dissolving (a) the component and including a non-proton solvent. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006091805(A) 申请公布日期 2006.04.06
申请号 JP20040314407 申请日期 2004.10.28
申请人 HITACHI CHEM CO LTD 发明人 SAKURAI HARUAKI;ABE KOICHI
分类号 G03F7/039;G03F7/004;G03F7/075;G03F7/40;H01L21/027 主分类号 G03F7/039
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