发明名称 |
RADIATION CURABLE COMPOSITION, ITS STORING METHOD, CURED FILM FORMING METHOD, PATTERN FORMING METHOD, PATTERN USAGE, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation curable composition for obtaining a hardener superior in pattern precision even when an exposure amount is comparatively small, and to provide its storing method, a cured film forming method, and a pattern forming method. <P>SOLUTION: The radiation curable composition contains (a) a component: a siloxane resin, (b) a component: a photo-acid generating agent or an optical base generating agent, and (c) a component: a solvent capable of dissolving (a) the component and including a non-proton solvent. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006091805(A) |
申请公布日期 |
2006.04.06 |
申请号 |
JP20040314407 |
申请日期 |
2004.10.28 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
SAKURAI HARUAKI;ABE KOICHI |
分类号 |
G03F7/039;G03F7/004;G03F7/075;G03F7/40;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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