| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proximity field exposure method and proximity field exposure equipment by which adhesion of foreign matters to an exposure mask is suppressed, a decline in yield is prevented, throughput is improved, and frequencies durable in use are increased reducing elastic deterioration causing breakdown of the exposure mask, in contact exposure by the exposure mask. <P>SOLUTION: In the proximity field exposure method in which exposure is made using a proximity field which oozes from a minute opening formed at the exposure mask, a contact/peeling process is used where the exposure mask is peeled after the exposure mask 501 elastically deformable is deformed to and put into close contact with a resist substrate 502, wherein a contact control method and its equipment for the proximity field exposure mask are constituted employing piezoelectric actuators 505, 506 to put the exposure mask into contact with and peel it from the resist substrate in the contact/peeling process. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
