发明名称 SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR ELEMENT AND SEMICONDUCTOR LIGHT EMITTING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To enhance performance of a semiconductor element by improving flatness of each semiconductor layer crystal-growing on a GaN substrate in a dimension equivalent of a target semiconductor element. <P>SOLUTION: There are provided: a GaN substrate 11 having a surface orientation defined by an absolute value of an off-angle of the surface from ä0001} plane towards <1-100> direction lying in a range of 0.14 degree to 0.35 degree and by an absolute value of an off-angle of the surface from ä0001} plane towards <11-20> direction lying in a range of 0.00 degree to 0.06 degree, a nitride III-V compound semiconductor layer 12 laminated on the GaN substrate 11; and an element structure part 13-20 on the nitride III-V compound semiconductor layer 12. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006093683(A) 申请公布日期 2006.04.06
申请号 JP20050243330 申请日期 2005.08.24
申请人 TOSHIBA CORP 发明人 TACHIBANA KOICHI;HONGO CHIE;NUNOGAMI SHINYA;ONOMURA MASAAKI
分类号 H01L29/201;H01L21/205;H01L21/331;H01L21/338;H01L29/04;H01L29/737;H01L29/778;H01L29/812;H01L33/16;H01L33/32;H01S5/323 主分类号 H01L29/201
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