发明名称 |
GERMANIUM ADDITIONAL SOURCE FOR COMPOUND SEMICONDUCTOR, METHOD OF MANUFACTURING COMPOUND SEMICONDUCTOR USING THE SAME, AND COMPOUND SEMICONDUCTOR |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an additional source of germanium with high safety when manufacturing a Ge-doped compound semiconductor. <P>SOLUTION: When the Ge-doped compound semiconductor such as a Ge-doped GAN layer 4 is formed on an AIN high-temperature buffer layer 2 and an undoped GAN base layer 3 which are stacked on a sapphire substrate 1, an organic germanium compound is used as an impurity source which contains at least one selected from a group composed of tetramethylgermanium and tetraethylgermanium as the additional source of germanium. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006093681(A) |
申请公布日期 |
2006.04.06 |
申请号 |
JP20050242611 |
申请日期 |
2005.08.24 |
申请人 |
SHOWA DENKO KK |
发明人 |
OKUYAMA MINEO;TOMOSAWA HIDEKI |
分类号 |
H01L21/205;H01L33/06;H01L33/12;H01L33/32 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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