发明名称 GERMANIUM ADDITIONAL SOURCE FOR COMPOUND SEMICONDUCTOR, METHOD OF MANUFACTURING COMPOUND SEMICONDUCTOR USING THE SAME, AND COMPOUND SEMICONDUCTOR
摘要 <P>PROBLEM TO BE SOLVED: To provide an additional source of germanium with high safety when manufacturing a Ge-doped compound semiconductor. <P>SOLUTION: When the Ge-doped compound semiconductor such as a Ge-doped GAN layer 4 is formed on an AIN high-temperature buffer layer 2 and an undoped GAN base layer 3 which are stacked on a sapphire substrate 1, an organic germanium compound is used as an impurity source which contains at least one selected from a group composed of tetramethylgermanium and tetraethylgermanium as the additional source of germanium. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006093681(A) 申请公布日期 2006.04.06
申请号 JP20050242611 申请日期 2005.08.24
申请人 SHOWA DENKO KK 发明人 OKUYAMA MINEO;TOMOSAWA HIDEKI
分类号 H01L21/205;H01L33/06;H01L33/12;H01L33/32 主分类号 H01L21/205
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