| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged beam drawing device for improving the drawing precision of the charged beam drawing device. SOLUTION: The tendency of beam current distribution on a first formation aperture 8 is measured in a plurality of deflection states deflected by a first deflection means 2, and feedback is made to the first deflection means 2 according the measurement value, thus making an adjustment regarding the position relationship between the opening of a limitation aperture 4 and the current density distribution of beams on the limitation aperture 4. COPYRIGHT: (C)2006,JPO&NCIPI
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