发明名称 CONTROLLING THE HARDNESS OF ELECTRODEPOSITED COPPER COATINGS BY VARIATION OF CURRENT PROFILE
摘要 <p>Pulse reverse electrolysis of acid copper solutions is used for applying copper deposits of a controlled hardness for applications such as producing printing cylinders. The benefits include improved production capacity. Hardness of the deposit is controlled by varying at least one factor selected from the group consisting of (i) cathodic pulse time, (ii) anodic pulse time, (iii) cathodic pulse current density, and (iv) anodic pulse current density. Preferably the ratio of cathodic pulse time to anodic pulse time is varied.</p>
申请公布号 WO2006036252(A2) 申请公布日期 2006.04.06
申请号 WO2005US24184 申请日期 2005.07.11
申请人 MACDERMID, INCORPORATED 发明人 HERDMAN, RODERICK, D.;PEARSON, TREVOR;LONG, ERNEST;GARDNER, ALAN
分类号 C25D5/18 主分类号 C25D5/18
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