发明名称 |
CONTROLLING THE HARDNESS OF ELECTRODEPOSITED COPPER COATINGS BY VARIATION OF CURRENT PROFILE |
摘要 |
<p>Pulse reverse electrolysis of acid copper solutions is used for applying copper deposits of a controlled hardness for applications such as producing printing cylinders. The benefits include improved production capacity. Hardness of the deposit is controlled by varying at least one factor selected from the group consisting of (i) cathodic pulse time, (ii) anodic pulse time, (iii) cathodic pulse current density, and (iv) anodic pulse current density. Preferably the ratio of cathodic pulse time to anodic pulse time is varied.</p> |
申请公布号 |
WO2006036252(A2) |
申请公布日期 |
2006.04.06 |
申请号 |
WO2005US24184 |
申请日期 |
2005.07.11 |
申请人 |
MACDERMID, INCORPORATED |
发明人 |
HERDMAN, RODERICK, D.;PEARSON, TREVOR;LONG, ERNEST;GARDNER, ALAN |
分类号 |
C25D5/18 |
主分类号 |
C25D5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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