| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a solid image-capturing element which reduces dimensional errors at joints to enable highly precise and reliable pattern formation in manufacturing an element whose device area is larger than the exposure area of an exposure device. <P>SOLUTION: A method is provided for manufacturing the solid image-capturing element. The image-capturing element comprises a photoelectric converter, a charge transfer which has charge transfer electrodes for transferring charges generated at the photoelectric converter, and a wiring which is connected to the photoelectric converter or to the charge transfer. According to the method, an exposure process for forming the patterns on the same layer that compose the photoelectric converter, charge transfer, or wiring includes a first exposure process of exposing a first area, and a second exposure process of exposing a second area having an area overlapping the first area. The overlapping area is so formed as to build an synthetic image given by mask data used in both first and second exposure processes. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
