EXPOSURE DEVICE, METHOD OF MANUFACTURING SUBSTRATE FOR ELECTROOPTICAL DEVICE, AND METHOD OF MANUFACTURING ELECTROOPTICAL DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an exposure device whose depth of focus etc., is easily adjusted for precise exposure processing, and methods of manufacturing a substrate for an electrooptical device using the same and the electrooptical device.

SOLUTION: The exposure device equipped with a stepper plate stage, and the methods of manufacturing the substrate for the electrooptical device using the same and the electrooptical device are characterized in that a reflection suppressing member of ≤150 μm in thickness, e.g. a light absorbing film and an antireflective film are formed on a main surface of the stepper plate stage.

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