| 摘要 |
An apparatus for conditioning a polishing pad. A turntable is mounted to a frame, where the turntable is adapted to receive and rotate the polishing pad. A conditioning head is also mounted to the frame, where the conditioning head is adapted to spray a liquid from the conditioning head against the polishing pad at a pressure that is sufficient to dislodge eroded material from the polishing pad. In this manner, a sufficiently abrasive spray can be generated, which can release the loaded material from the polishing pad, and otherwise condition the polishing pad. The spray also enables the released material to be washed away from the pad. In addition, because the abrasive action is provided by the force of the spray, there are no abrasive particles that can break free from the conditioning head and disrupt the desired operation of the pad.
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