发明名称 Particle detection device, lithographic apparatus and device manufacturing method
摘要 To enable differentiation between a particle and a ghost particle, a detector system is presented. The detector system is configured to output at least two detector signals corresponding to an intensity of radiation being incident on the detector system. If radiation is received from a ghost particle, not all of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a contaminating particle results in all signals having a level above a threshold level. Thus, it may be determined with a high accuracy whether a particle or a ghost particle is redirecting radiation towards the detector system.
申请公布号 US2006072107(A1) 申请公布日期 2006.04.06
申请号 US20040957752 申请日期 2004.10.05
申请人 ASML NETHERLANDS B.V. 发明人 ONVLEE JOHANNES;GREVE PETER F.;FRANSSEN JOHANNES HENDRIKUS G.
分类号 G01N21/00 主分类号 G01N21/00
代理机构 代理人
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