PATTERN FORMATION MATERIAL, PATTERN FORMATION DEVICE, AND PATTERN FORMATION METHOD

摘要

There is provided a pattern formation material capable of effectively suppressing lowering of sensitivity of a photo-sensitive layer and forming an accurate pattern. There are also provided a pattern formation device using the pattern formation material and a pattern formation method using the pattern formation material. For this, at least a photo-sensitive layer is provided on a support body and the support body has a haze value not greater than 5.0%. The photo-sensitive layer includes as a sensitizing agent, at least one selected from the group consisting of a pigment having an acid kernel, a pigment having a basic kernel, and a fluorescent bleach. When the photo-sensitive layer is exposed and developed, the thickness of the exposed portion of the photo-sensitive layer is not changed before and after the development. The minimum energy of the light used for the exposure is 0.1 to 20 (mJ/cm<sup