发明名称 RESIN COMPOSITION FOR RESIST
摘要 <P>PROBLEM TO BE SOLVED: To provide a resin composition for a permanent protection film resist which is halogen-free, and has a self-extinguishing property in itself. <P>SOLUTION: In the resin composition for resist, 100-200 pts. wt. of aluminum hydroxide (e), 0.1-20 pts. wt. of a molybdenum compound (f) and 0.1-30 pts. wt. of zinc borate (g) are blended into 100 pts. wt. of a resin component of the resin composition compposed of an unsaturated group containing polycarboxylic acid resin (a) obtained by reacting a polybasic acid anhydride with a product of a reaction between an epoxyacrylate and a cyanate ester compound, an epoxy resin (b), ethylenically unsaturated monomer (c) and a photo-polymerization initiator (d) as essential ingredients,. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006091243(A) 申请公布日期 2006.04.06
申请号 JP20040274689 申请日期 2004.09.22
申请人 MITSUBISHI GAS CHEM CO INC 发明人 YASUNAGA TOMOKAZU;IKEGUCHI NOBUYUKI
分类号 G03F7/027;G03F7/004;H05K3/28 主分类号 G03F7/027
代理机构 代理人
主权项
地址