发明名称 METHOD AND APPARATUS FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus for treating substrate capable of performing efficient voltage-resistant treatment on a substrate to produce a image display device having high resistance to voltage. SOLUTION: In a vacuum atmosphere, a treating electrode 34 covered with a dielectric layer 39 is opposed to a treated substrate 11 and an electric field is applied between them to perform voltage-resistant treatment on the substrate. In the vacuum atmosphere, the electrode is withdrawn from the position opposed to the substrate, and then the dielectric layer is heated and melted once to get extraneous matters on the surface of the electrode into the layer and lay it down. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006092797(A) 申请公布日期 2006.04.06
申请号 JP20040273687 申请日期 2004.09.21
申请人 TOSHIBA CORP 发明人 SASAKI KINICHI;TAKAHASHI MASAO;IZEKI YASUSHI;KOIDE SATORU
分类号 H01J9/38 主分类号 H01J9/38
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