| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a rugged pattern and a method for manufacturing an optical element by which a fine rugged resist pattern with high aspect ratio is formed only by light irradiation by making an etching process unnecessary. <P>SOLUTION: A layer of photosensitive materials with predetermined thickness is formed on the surface of a substrate W, exposure beams LT, LR are irradiated from two or more directions to a predetermined part of the layer of the photosensitive materials, the exposure beams are made to interfere in the layer of the photosensitive materials and exposure for locally controlling a reaction time constant of the photosensitive materials is performed by controlling intensity and frequencies of the exposure beams. A development processing is performed to the layer of the photosensitive materials after the exposure and a plurality of fine rugged patterns are formed on the surface of the layer of the photosensitive materials. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
