| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To form a fine pattern under the same exposure conditions without depending upon the shape or closeness of the pattern. <P>SOLUTION: An image enhancing mask 6 for pattern formation includes a transmissive substrate which transmits exposure light and a semi-light-shielding portion 8 which is formed on the transmissive substrate and has transmittance allowing the exposure light to be partially transmitted and corresponds to an isolation line pattern, and a phase shifter 9 which is provided at an opening in the semi-light-shielding portion 8. The image enhancing mask 6 has a semi-light-shielding mask pattern formed of the semi-light-shielding portion 8 which transmits the exposure light in the same phase with a translucent part 7 as a reference and the phase shifter 9 which transmits the exposure light in the opposite phase with the translucent part 7 as a reference. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
