| 摘要 |
PROBLEM TO BE SOLVED: To facilitate maintenance of a substrate transfer mechanism, by moving the substrate transfer mechanism below a grating floor surface. SOLUTION: Substrate processing equipment 610 is mounted on a grating 605 and arranged at a second-floor section 602 in the space above the grating 605. The substrate-processing equipment 610 comprises a plurality of processing units and a main transfer robot MTR. The plurality of processing units are provided so as to enclose the main transfer robot MTR. An elevator mechanism 615 lifts and lowers the main transfer robot MTR, between the second-floor section 602 above the grating 605 and a first-floor section 601 therebelow. The main transfer robot MTR can be sujected to maintenance from every direction, by lowering the main transfer robot MTR to the first-floor section 601 using the elevator mechanism 615. COPYRIGHT: (C)2006,JPO&NCIPI
|
