发明名称 FOCAL PLANE SHUTTER AND SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a focal plane shutter having a substrate superior in wear resistance and corrosion resistance. SOLUTION: The focal plane shutter includes a front curtain 10 having blades 11 to 14 and a rear curtain 20 having blades 21 to 24. A rear curtain arm 26 pivotally supports the blades 21 to 24 turnably through connection pins 27a to 27d, and a first substrate 30 having an opening 30a is disposed in parallel with and adjacently to a turning trajectory surface of the rear curtain arm 26 and has a nickel plating layer 2 and a black oxide layer 3 formed on a surface A thereof to suppress progress of wear and has the surface of the black oxide layer 3 treated by sand blasting to enhance the corrosion resistance of the substrate. A surface B of a second substrate 31 is treated in the same manner. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006091505(A) 申请公布日期 2006.04.06
申请号 JP20040277732 申请日期 2004.09.24
申请人 NIKON CORP 发明人 KANEMURO MASAYUKI
分类号 G03B9/36;G03B9/10 主分类号 G03B9/36
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