| 发明名称 |
Process and composition for removing residues from the microstructure of an object |
| 摘要 |
<p>A process for removing residues from the microstructure of an object is provided, which comprises steps of preparing a remover including carbon dioxide, an additive for removing the residues and a co-solvent dissolving the additive in said carbon dioxide at a pressurized fluid condition; andbringing the object into contact with the remover so as to remove the residues from the object. A composition for removing residues from the microstructure of an object is also provided.</p> |
| 申请公布号 |
EP1365441(B1) |
申请公布日期 |
2006.04.05 |
| 申请号 |
EP20030011130 |
申请日期 |
2003.05.22 |
| 申请人 |
KABUSHIKI KAISHA KOBE SEIKO SHO |
发明人 |
MASUDA, KAORU;IIJIMA, KATSUYUKI;YOSHIKAWA, TETSUYA;PETERS, DARRY W. |
| 分类号 |
H01L21/00;B08B7/00;C11D7/26;C11D7/30;C11D7/32;C11D7/50;C11D7/60;C11D11/00;G03F7/42;H01L21/027;H01L21/304 |
主分类号 |
H01L21/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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