APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATES,申请号KR20030059118-传众专利搜索

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发明名称	APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATES
摘要
申请公布号	KR100568104(B1)	申请公布日期	2006.04.05
申请号	KR20030059118	申请日期	2003.08.26
申请人		发明人
分类号	H01L21/304;B08B3/02;B08B3/04;B08B3/10;F26B5/16;H01L21/00;H01L21/302;H01L21/306	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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