| 摘要 |
A semi-light shielding portion (3) and a phase shifter (5), passes an exposure light in phase and out-off phase with respect to a translucent portion (4). The phase shifter partially cancels the light passed through the translucent portion and semi-light shielding portion. Independent claims are also included for the following: (1) photomask production method; and (2) mask pattern forming method. |
