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发明名称
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING COMPENSATION IMPLANT
摘要
申请公布号
KR20060029009(A)
申请公布日期
2006.04.04
申请号
KR20040077964
申请日期
2004.09.30
申请人
HYNIX SEMICONDUCTOR INC.
发明人
JIN, SEUNG WOO;LEE, MIN YONG;ROUH, KYOUNG BONG
分类号
H01L21/265
主分类号
H01L21/265
代理机构
代理人
主权项
地址
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