发明名称 Memory cell structure
摘要 A memory structure that reduces soft-errors for us in CMOS devices is provided. The memory cell layout utilizes transistors oriented such that the source-to-drain axis is parallel a shorted side of the memory cell. The dimensions of the memory cell are such that it has a longer side and a shorter side, wherein the longer side is preferably about twice as long as the shorter side. Such an arrangement uses a shorter well path to reduce the resistance between transistors and the well strap. The shorter well strap reduces the voltage during operation and soft errors.
申请公布号 US7023056(B2) 申请公布日期 2006.04.04
申请号 US20030723331 申请日期 2003.11.26
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LIAW JHON-JHY
分类号 H01L29/76;G11C11/34;G11C11/412;G11C16/04;H01L21/8234;H01L21/8244;H01L27/092;H01L27/10;H01L27/11;H01L29/78;H01L29/94;H01L31/062;H01L31/113;H01L31/119 主分类号 H01L29/76
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