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发明名称
ISOLATION AREA FORMING METHOD OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100567054(B1)
申请公布日期
2006.04.04
申请号
KR19990062641
申请日期
1999.12.27
申请人
发明人
分类号
H01L21/76
主分类号
H01L21/76
代理机构
代理人
主权项
地址
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