发明名称 |
Hybrid electronic mask |
摘要 |
An electronically programmable mask for lithography has an array of individually controllable light sources aligned with an array of individually controllable liquid crystals, so that individual pixels may be turned on or off and phase-shifted to provide a desired light intensity distribution on a wafer. The mask may be used in a contact printing mode or in a reduction projection mode.
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申请公布号 |
US7023528(B2) |
申请公布日期 |
2006.04.04 |
申请号 |
US20020167327 |
申请日期 |
2002.06.10 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HSU LOUIS L.;RADENS CARL J.;WANG LI-KONG;WONG KWONG HON |
分类号 |
G03B27/72;G03B27/42;G03B27/54;G03F1/00;G03F7/20 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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