CHEMICAL VAPOR DEPOSITION APPARATUS FOR DEPOSITING DOUBLE LAYERED BARRIER METAL IN SITU AND DEPOSITION METHOD FOR BARRIER METAL USING THE SAME,申请号KR20040077928-传众专利搜索

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发明名称	CHEMICAL VAPOR DEPOSITION APPARATUS FOR DEPOSITING DOUBLE LAYERED BARRIER METAL IN SITU AND DEPOSITION METHOD FOR BARRIER METAL USING THE SAME
摘要
申请公布号	KR20060028985(A)	申请公布日期	2006.04.04
申请号	KR20040077928	申请日期	2004.09.30
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	KWON, YONG IL
分类号	C23C16/505;C23C16/44	主分类号	C23C16/505
代理机构		代理人
主权项
地址

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