发明名称 Diaphragm valve with reliability enhancements for atomic layer deposition
摘要 A shut-off type diaphragm valve adapted for use in an atomic layer deposition system includes a valve seat having an annular seating surface that surrounds an inlet of the valve and extends radially therefrom. The seating surface contacts a substantial portion of the first side of a flexible diaphragm when the diaphragm is closed, to facilitate heat transfer and counteract dissipative cooling of the diaphragm, thereby inhibiting condensation of a medium flowing through the valve passage. The seating surface is preferably flat and smooth, to prevent shearing of an elastomeric diaphragm. For a plastic diaphragm, a ring-shaped seating ridge may extend from the seating surface to cause localized permanent deformation of the diaphragm and enhanced sealing, while still allowing a substantial portion of the diaphragm to contact the seating surface for enhanced heat transfer. Valve speed enhancements and other reliability enhancing features are also described.
申请公布号 US7021330(B2) 申请公布日期 2006.04.04
申请号 US20030609339 申请日期 2003.06.26
申请人 PLANAR SYSTEMS, INC. 发明人 MAULA JARMO ILMARI;LESKINEN HANNU;LANG TEEMU;KUOSMANEN PEKKA;HAERKOENEN KARI;AITCHISON BRADLEY J.
分类号 F16K49/00;F16K7/14;F16K31/06;F16K31/126 主分类号 F16K49/00
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